Automated CD measurements with the Hitachi S-6280

Elizabeth E. Chain; Edward P. Baaklini

doi:10.1117/12.209216

22 May 1995 Automated CD measurements with the Hitachi S-6280

Elizabeth E. Chain, Edward P. Baaklini

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209216
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The Hitachi Model S-6280 high resolution field emission Scanning Electron Microscope (SEM) is used at Motorola's MOS-12 facility for Critical Dimension (CD) measurements of less than 1 micrometer in size. This tool is used to measure 200-mm diameter wafers with a low accelerating voltage in the range 0.7-1.0 kV. During new process development the tool is run in both manual mode and in a fully automated mode utilizing patten recognition for global alignment as well as feature CD measurement. Results on the reproducibility of fully- automated measurements show that this technique provides a significantly improved measurement capability compared to the standard manual technique.

Citation Download Citation

Elizabeth E. Chain and Edward P. Baaklini "Automated CD measurements with the Hitachi S-6280", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209216

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