Paper
26 May 1995 Comparison of scalar and vector modeling of image formation in photoresist
Chris A. Mack, Ching-Bo Juang
Author Affiliations +
Abstract
A comparison is made between several scalar models for the formation of an image in a photoresist film with differing approximations and a vector model. It was found that up to a numerical apertures of 0.7, a full scalar model showed no appreciable deviation from the vector mode. However, when several common assumptions were made to simplify the scalar model, significant errors resulted at a higher numerical apertures.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack and Ching-Bo Juang "Comparison of scalar and vector modeling of image formation in photoresist", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209270
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Photoresist materials

Image acquisition

Lithography

Diffraction

Mathematical modeling

Wave propagation

Light wave propagation

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