Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends

Toshiyuki Horiuchi; Katsuhiro Harada; Yoshinobu Takeuchi; Yoshiaki Mimura; Emi Tamechika

doi:10.1117/12.212793

3 July 1995 Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends

Toshiyuki Horiuchi, Katsuhiro Harada, Yoshinobu Takeuchi, Yoshiaki Mimura, Emi Tamechika

Author Affiliations +

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212793
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

This article describes particular patterning characteristics of annular illumination lithography and a method to improve them. Annular illumination lithography is one of the most practical methods to enhance resolution and enlarge focus latitude. However, improving the patterning characteristics is not sufficient at the ends of periodical patterns in spite of superior performance at the periodical parts. Here, the degradation of the patten profiles at the periodical ends are investigated in detail, and size-modification of the end patterns is proposed. By making the reticle pattern widths a little wider only at the ends, end-pattern degradation is greatly improved, and practical depth-of-focus is favorably extended.

Citation Download Citation

Toshiyuki Horiuchi, Katsuhiro Harada, Yoshinobu Takeuchi, Yoshiaki Mimura, and Emi Tamechika "Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212793

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