Integrated CAD framework linking VLSI layout editors and process simulators

Chaitali Sengupta; Miklos Erdelyi; Zsolt Bor; Joseph R. Cavallaro; Michael C. Smayling; Gabor Szabo; Frank K. Tittel; William L. Wilson Jr.

doi:10.1117/12.240955

7 June 1996 Integrated CAD framework linking VLSI layout editors and process simulators

Chaitali Sengupta, Miklos Erdelyi, Zsolt Bor, Joseph R. Cavallaro, Michael C. Smayling, Gabor Szabo, Frank K. Tittel, William L. Wilson Jr.

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240955
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifted masks for photolithography, will be needed. Under these conditions, the only means for the circuit designer to design compact and efficient circuits with good yield capabilities is to be able to see the effect of different design approaches on manufactured silicon, instead of solely relying on conservative general design rules. The integrated CAD framework accomplishes this by providing a link between a layout editor (Magic), advanced photolithographic techniques such as phase shifted masks, and a process simulator (Depict). This paper discusses some applications of this tool. A non- conventional process technique involving interferometric phase shifting and off-axis illumination has been evaluated using the tool. Also, a feature of the CAD framework which allows representation of a phase shifted mask, together with its layout analysis capability has been used to compact a piece of layout by inserting phase shifted elements into it.

Citation Download Citation

Chaitali Sengupta, Miklos Erdelyi, Zsolt Bor, Joseph R. Cavallaro, Michael C. Smayling, Gabor Szabo, Frank K. Tittel, and William L. Wilson Jr. "Integrated CAD framework linking VLSI layout editors and process simulators", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240955

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available