Laser-induced chemical vapor deposition of optical thin films on curved surfaces

Shoshana Tamir; S. Berger; Kopel Rabinovitch; Mordechai Gilo; Reuben Dahan

doi:10.1117/12.281399

22 September 1997 Laser-induced chemical vapor deposition of optical thin films on curved surfaces

Shoshana Tamir, S. Berger, Kopel Rabinovitch, Mordechai Gilo, Reuben Dahan

Proceedings Volume 3110, 10th Meeting on Optical Engineering in Israel; (1997) https://doi.org/10.1117/12.281399
Event: 10th Meeting on Optical Engineering in Israel, 1997, Jerusalem, Israel

Abstract

Laser induced chemical vapor deposition (LCVD) of silicon nitride and silicon dioxide single and double layers have been investigated using excimer laser operating at a wavelength of 193 nm. The composition of silicon nitride which was formed in SiH₄/NH₃ gas mixture was nearly stochiometric having a refractive index of 1.8 - 1.9 and contained small amount of hydrogen. Deposition of silicon dioxide was investigated using SiH₄/N₂O. Using this gas mixture the film composition depended strongly upon the SiH₄/N₂O ratio. At high ratio the film formed was silicon oxynitride, which contained both Si-N and Si-O bonds. The film also contained small amount of Si-H bonds. Decreasing SiH₄/N₂O ratio led to the formalin of pure silicon dioxide with a refractive index of 1.45. A double layer coating of both silicon nitride and silicon dioxide resulted in the formation of antireflection coating with a reflectivity of about 0.5% at 750 nm.

Citation Download Citation

Shoshana Tamir, S. Berger, Kopel Rabinovitch, Mordechai Gilo, and Reuben Dahan "Laser-induced chemical vapor deposition of optical thin films on curved surfaces", Proc. SPIE 3110, 10th Meeting on Optical Engineering in Israel, (22 September 1997); https://doi.org/10.1117/12.281399

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