Synthesis of ultrathin diamond film on fused silica substrate

Tianliang Hao; Chengru Shi

doi:10.1117/12.300666

20 February 1998 Synthesis of ultrathin diamond film on fused silica substrate

Tianliang Hao, Chengru Shi

Author Affiliations +

Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300666
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China

Abstract

A technique of ultrasonic surface pretreatment in diamond powder slurry to enhance diamond nucleation has been developed. Under appropriate pretreatment and growth conditions, diamond grain densities of approximately 10¹⁰ cm^-2 have been obtained on fused silica substrates. The synthesis technique of ultrathin diamond film on fused silica substrates by a hot filament chemical vapor deposition was studied, and high quality ultrathin diamond films with smooth surface were obtained. The optical transmittance of the film with a thickness of approximately 0.3 micrometer on fused silica substrate reached as high as 68% at wavelength of 800 nm.

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Tianliang Hao and Chengru Shi "Synthesis of ultrathin diamond film on fused silica substrate", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300666

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