Optimization of optical parameters for a critical i-line resist system

Rosemary Bell

doi:10.1117/12.312476

29 June 1998 Optimization of optical parameters for a critical i-line resist system

Rosemary Bell

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312476
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Optimized optical parameters can enhance the performance of resist systems. Expanded process latitudes can be achieved through the manipulation of the optical levers on a variable parameter stepper, extending a resist system's capability over a wider range of applications. In this study, the parameters being examined are numerical aperture, partial coherence and annularity. A 3³ experiment of the optical factors was performed to screen for interactions between factors and to establish a resist model which can characterize behavior over the design space. Responses include energy to clear (E_o), sizing energy (E_s), sizing ratio (E_s/E_o), Iso/Dense bias, masking linearity, resolution, exposure latitude, focus latitude, and feature profile. Equations are presented to predict resist performance of selected responses for dense lines/spaces, isolated lines, trenches and contact holes. Optical parameter combinations are cited to optimize performance of individual features.

Citation Download Citation

Rosemary Bell "Optimization of optical parameters for a critical i-line resist system", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312476

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