High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge

Tatsuo Enami; Osamu Wakabayashi; Toshihiro Nishisaka; Natsushi Suzuki; Takashi Nire; Hakaru Mizoguchi; Hiroaki Nakarai; Hirokazu Tanaka; Tatsuya Ariga; Kouji Shio; Takeshi Okamoto; Ryoichi Nodomi; Hitoshi Tomaru; Kiyoharu Nakao

doi:10.1117/12.310733

29 June 1998 High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge

Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, Kouji Shio, Takeshi Okamoto, Ryoichi Nodomi, Hitoshi Tomaru, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310733
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We present the performance and durability of the newest model of the KrF excimer laser for microlithography KLES-G10K. The laser achieves 10 W of output power with 0.7 pm bandwidth at 1000 Hz with newly developed solid state pulsed power module and the high precise narrowing module. The durability of laser tube achieves 5 billion pulses with the new radio frequency preionization scheme, which reduces consumption of fluorine gas and maintenance of laser tube drastically.

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Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, Kouji Shio, Takeshi Okamoto, Ryoichi Nodomi, Hitoshi Tomaru, and Kiyoharu Nakao "High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310733

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