Paper
20 April 1998 Photoacoustic techniques for determination of thresholds of failure during laser processing of substrate materials for integrated electronics
Sergiy M. Baschenko, Ivan V. Blonskij, Viacheslav M. Puzikov, Oleg Ya. Dan'ko, Alexander G. Filin
Author Affiliations +
Proceedings Volume 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997; (1998) https://doi.org/10.1117/12.306272
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1997, Kiev, Ukraine
Abstract
Possibility of application of the photoacoustic methods for determination of threshold of failure of plates caused by power light pulses (up to 300 MW/mm2) of the excimer XeCl* laser is demonstrated. The original system on the basis of the XeCl* laser for a high-precision processing of sapphire plates and other construction materials is developed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergiy M. Baschenko, Ivan V. Blonskij, Viacheslav M. Puzikov, Oleg Ya. Dan'ko, and Alexander G. Filin "Photoacoustic techniques for determination of thresholds of failure during laser processing of substrate materials for integrated electronics", Proc. SPIE 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997, (20 April 1998); https://doi.org/10.1117/12.306272
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Cited by 2 scholarly publications.
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KEYWORDS
Laser damage threshold

Laser processing

Sapphire

Excimer lasers

Photoacoustic spectroscopy

Electronics

Visualization

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