High-performance photomask cleaning process using electrolyzed water

Yoshikazu Nagamura; Hozumi Usui; Nobuyuki Yoshioka; H. Morimoto

doi:10.1117/12.328853

1 September 1998 High-performance photomask cleaning process using electrolyzed water

Yoshikazu Nagamura, Hozumi Usui, Nobuyuki Yoshioka, H. Morimoto

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328853
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

A new photomask cleaning process using electrolyzed water was suggested in this work. This process using the cathode water with a small amount of ammonium hydroxide showed good efficiencies of removing particles from photomask surfaces. MoSiON surface was not so damaged in the alkaline cathode water compared with in APM. The rinsing process in the anode water eliminated the sulfuric acid residue on the surfaces of quartz substrates. Using electrolyzed water reduced the consumptions of the chemicals, the water and the energy.

Citation Download Citation

Yoshikazu Nagamura, Hozumi Usui, Nobuyuki Yoshioka, and H. Morimoto "High-performance photomask cleaning process using electrolyzed water", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328853

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