Actinic detection of EUVL mask blank defects

Seongtae Jeong; Mourad Idir; Lewis E. Johnson; Yun Lin; Phillip J. Batson; Richard Levesque; Patrick A. Kearney; Pei-yang Yan; Eric M. Gullikson; James H. Underwood; Jeffrey Bokor

doi:10.1117/12.332865

18 December 1998 Actinic detection of EUVL mask blank defects

Seongtae Jeong, Mourad Idir, Lewis E. Johnson, Yun Lin, Phillip J. Batson, Richard Levesque, Patrick A. Kearney, Pei-yang Yan, Eric M. Gullikson, James H. Underwood, Jeffrey Bokor

Author Affiliations +

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332865
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

We report the design and initial experimental results of an actinic inspection system for extreme ultraviolet lithography mask blank defect detection. Initial bright-field and dark- field results demonstrate sensitivity to submicron size phase defects.

Citation Download Citation

Seongtae Jeong, Mourad Idir, Lewis E. Johnson, Yun Lin, Phillip J. Batson, Richard Levesque, Patrick A. Kearney, Pei-yang Yan, Eric M. Gullikson, James H. Underwood, and Jeffrey Bokor "Actinic detection of EUVL mask blank defects", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332865

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