Watt-level DUV generation by solid state laser for lithography

Yasu Ohsako; Jun Sakuma; Andrew Finch; Kyoichi Deki; Masahiro Horiguchi; Toshio Yokota

doi:10.1117/12.354361

26 July 1999 Watt-level DUV generation by solid state laser for lithography

Yasu Ohsako, Jun Sakuma, Andrew Finch, Kyoichi Deki, Masahiro Horiguchi, Toshio Yokota

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354361
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The first all-solid-state laser system generating 1 W of 196 nm light at a 5-kHz pulse-repetition rate has been developed. The laser system consists of a Neodymium:Yttrium Lithium Fluoride maser oscillator power amplifier operating at 5 kHz, a single-frequency, gain-switched Titanium:sapphire laser, and additional frequency conversion stages utilizing nonlinear crystal such as Cesium Lithium Borate grown by USHIO and Lithium Triborate. The performance of each system component will discussed as well as the novel pathway employed to reach 196 nm.

Citation Download Citation

Yasu Ohsako, Jun Sakuma, Andrew Finch, Kyoichi Deki, Masahiro Horiguchi, and Toshio Yokota "Watt-level DUV generation by solid state laser for lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354361

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