Preliminary results on the use of mirrors for LIGA process

Stephan Megtert; Franz Josef Pantenburg; Sven Achenbach; Roland K. Kupka; Juergen Mohr; Marc Roulliay

doi:10.1117/12.341158

10 March 1999 Preliminary results on the use of mirrors for LIGA process

Stephan Megtert, Franz Josef Pantenburg, Sven Achenbach, Roland K. Kupka, Juergen Mohr, Marc Roulliay

Proceedings Volume 3680, Design, Test, and Microfabrication of MEMS and MOEMS; (1999) https://doi.org/10.1117/12.341158
Event: Design, Test, and Microfabrication of MEMS/MOEMS, 1999, Paris, France

Abstract

A double mirror system has been studied and realized for purposes of Deep x-ray Lithography/LIGA. Because structuring high aspect ratio resist ask for high photon flux to maintain exposure time compatible with industrial process, hard x-ray synchrotron radiation is necessary and its broadband spectrum is normally used. However one would need to shape this spectrum on both low and high-energy parts. The former may lead to resist surface overdoes and is treated by means of appropriate filters. The later is prejudicial at resist-metallic substrate interface where high-energy photons are preferentially absorbed giving rise to extra-dose even behind absorber patterns. This may result in microstructures adhesion break down for positive resist and incomplete dissolution for negative tone ones. A mirror set up in the upstream beam-line is a correct answer to prevent these effects. The association of filters and mirror gives an adjustable band-pass filter to fit almost exposure requirements in deep x-ray lithography. Preliminary result of such a system are presented concerning its band-pass filter character, flux performances and first comparative effects on resist microstructures.

Citation Download Citation

Stephan Megtert, Franz Josef Pantenburg, Sven Achenbach, Roland K. Kupka, Juergen Mohr, and Marc Roulliay "Preliminary results on the use of mirrors for LIGA process", Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); https://doi.org/10.1117/12.341158

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