Impact of high-order aberrations on the performance of the aberration monitor

Peter Dirksen; Casper A. H. Juffermans; Andre Engelen; Peter De Bisschop; Henning Muellerke

doi:10.1117/12.389010

5 July 2000 Impact of high-order aberrations on the performance of the aberration monitor

Peter Dirksen, Casper A. H. Juffermans, Andre Engelen, Peter De Bisschop, Henning Muellerke

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389010
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The aberration ring test is used to determine the low and high order lens aberrations. The method is based on two key elements: the linear response of ART to aberrations and the use of multiple imaging conditions. Once the model parameters are determined by means of simulations, the Zernike coefficients are solved from a set of linear equations. The Zernike coefficients thus obtained are correlated to interferometric lens data and to line width measurements.

Citation Download Citation

Peter Dirksen, Casper A. H. Juffermans, Andre Engelen, Peter De Bisschop, and Henning Muellerke "Impact of high-order aberrations on the performance of the aberration monitor", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389010

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available