High-repetition-rate ArF excimer laser for microlithography

Osamu Wakabayashi; Tatsuo Enami; Ken Ishii; Katsutomo Terashima; Yasuo Itakura; Takayuki Watanabe; Takeshi Ohta; Ayako Ohbu; Hirokazu Kubo; Hirokazu Tanaka; Satoshi Andou; Takashi Matsunga; Hiroshi Umeda; Toru Suzuki; Akira Sumitani; Hakaru Mizoguchi

doi:10.1117/12.405749

6 November 2000 High-repetition-rate ArF excimer laser for microlithography

Osamu Wakabayashi, Tatsuo Enami, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Satoshi Andou, Takashi Matsunga, Hiroshi Umeda, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

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Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405749
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan

Abstract

ArF excimer lasers are the light source of choice for the next generation of micro-lithographic tools enabling structures below the 130nm technology node. For these lithographic mass production lines Komatsu successfully developed an ArF excimer laser, named G20A, which has a 2kHz pulse repetition rate, 10W average power and 0.5pm (FWHM) spectral bandwidth. G20A has three significantly improved important items: (1) the high resolution line narrowing module, (2) the high power and high repetition rate solid state pulse power module, and (3) the Xe added laser gas yielding an improved overall laser performance. ArF laser spectra were determined with out newly developed high-resolution spectrometer. The instrument function of the spectrometer was measured with a 193nm coherent light source jointly developed with the University of Tokyo. The laser gas composition is one key parameter of excimer laser performance. The deteriorating effect of impurities on ArF performance is e.g. ten times larger than on KrF performance. We observed that added Xe gas, however, has a beneficial effect on the pulse energy and the energy stability at high repetition rates. Experimental results of a currently developed 4 kHz ArF laser are also reported.

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Osamu Wakabayashi, Tatsuo Enami, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Satoshi Andou, Takashi Matsunga, Hiroshi Umeda, Toru Suzuki, Akira Sumitani, and Hakaru Mizoguchi "High-repetition-rate ArF excimer laser for microlithography", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); https://doi.org/10.1117/12.405749

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KEYWORDS

Excimer lasers

Gas lasers

Xenon

Laser development

Laser stabilization

Pulsed laser operation

Light sources

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