Paper
25 October 2000 Multiaperture beam integrators and odd-shaped irradiance patterns
Daniel M. Brown, Jeremiah D. Brown
Author Affiliations +
Abstract
Multi-aperture beam integrators are used to homogenize high power multi- mode lasers and arc lamps for various industrial applications. Some applications, such as product marking and laser machining, require specific odd-shape irradiance patterns on the target. Current masking techniques waste laser power. We explore here the techniques of aperture flipping and highly aberrated lenslets in the beams segmenter element of multi-aperture beam integrators.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel M. Brown and Jeremiah D. Brown "Multiaperture beam integrators and odd-shaped irradiance patterns", Proc. SPIE 4095, Laser Beam Shaping, (25 October 2000); https://doi.org/10.1117/12.405256
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Cited by 1 scholarly publication.
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KEYWORDS
Etching

Photoresist materials

Reactive ion etching

Semiconducting wafers

Laser marking

Ions

Laser applications

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