Depth-of-focus analysis of subwavelength features

Terence C. Barrett

doi:10.1117/12.435704

14 September 2001 Depth-of-focus analysis of subwavelength features

Terence C. Barrett

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435704
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

As the smallest desired feature dimensions decrease ever further below the wavelength of the imaging light, as the numerical aperture of the projection optics continues to increase, and as more degrees of freedom in exposure system setup are made available, so new attention is needed on the parameter space used to establish manufacturable process latitude. A detailed analysis of depth-of-focus data is presented for isolated lines which comprehends the effects of dynamic focal plane error, scan-direction dependence, non-quadratic through-focus behavior, measurement noise, and aberration content. This analysis is applied in a case study of the lens and stage adjustment process for a new exposure system.

Citation Download Citation

Terence C. Barrett "Depth-of-focus analysis of subwavelength features", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435704

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