Paper
5 April 2001 Electrostatic actuator designed for capacitive detections of orthogonal displacements of a few micrometers with a subnanometric sensitivity
E. Lennon, T. Fournier, J. Chaussy, F. Ayela
Author Affiliations +
Proceedings Volume 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001; (2001) https://doi.org/10.1117/12.425396
Event: Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, 2001, Cannes-Mandelieu, France
Abstract
This article presents an innovative micromachined silicon device with an electrostatic actuation and a capacitive detection. This device, which is no temperature dependent and shows no hysteretic distortion, is a free standing membrane with four coplanar electrodes in close proximity for the lateral displacements and a parallel electrode for the vertical displacement. The use of phosphorous doped silicon allows the application of an electrostatic force between one electrode and the moving diaphragm. The deep micromachining of the actuator and the electronic detection which gives way to a mechanical sensitivity below 1 angstrom/(root)Hz are presented. The sub-nanometric control of such a membrane with a very low calorific capacity and a relative large area allows new applications towards the scanning thermal microscopy.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Lennon, T. Fournier, J. Chaussy, and F. Ayela "Electrostatic actuator designed for capacitive detections of orthogonal displacements of a few micrometers with a subnanometric sensitivity", Proc. SPIE 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, (5 April 2001); https://doi.org/10.1117/12.425396
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Actuators

Silicon

Electrodes

Reactive ion etching

Gold

Microscopy

Lithography

Back to Top