Development of x-ray photoelectron microscopic system with a compact x-ray source

Chiemi Fujikawa; Naohiro Yamaguchi; Tadayuki Ohchi; Tamio T. Hara; Katsumi Watanabe; Ibuki Tanaka; Masami Taguchi

doi:10.1117/12.425648

23 April 2001 Development of x-ray photoelectron microscopic system with a compact x-ray source

Chiemi Fujikawa, Naohiro Yamaguchi, Tadayuki Ohchi, Tamio T. Hara, Katsumi Watanabe, Ibuki Tanaka, Masami Taguchi

Proceedings Volume 4424, ECLIM 2000: 26th European Conference on Laser Interaction with Matter; (2001) https://doi.org/10.1117/12.425648
Event: 26th European Conference on Laser Interaction with Matter (ECLIM 2000), 2000, Prague, Czech Republic

Abstract

We have constructed an x-ray photoelectron microscopic system with x-rays form laser-produced plasma as a source. X-rays involving amplified spontaneous emissions at 15.47 nm were collected by a Schwarzschild mirror coated with Mo/Si multilayers for 15.47 nm x-ray. As preliminary results, Ga 3d and As 3d electrons emitted form a GaAs wafer were observed in the photoelectron spectrum taken by 1 min accumulation.

Citation Download Citation

Chiemi Fujikawa, Naohiro Yamaguchi, Tadayuki Ohchi, Tamio T. Hara, Katsumi Watanabe, Ibuki Tanaka, and Masami Taguchi "Development of x-ray photoelectron microscopic system with a compact x-ray source", Proc. SPIE 4424, ECLIM 2000: 26th European Conference on Laser Interaction with Matter, (23 April 2001); https://doi.org/10.1117/12.425648

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