Optical and surface properties of ZnO thin films by PLD

Yongfeng Lu; H. Q. Ni; ZhongMin Ren

doi:10.1117/12.456835

25 February 2002 Optical and surface properties of ZnO thin films by PLD

Yongfeng Lu, H. Q. Ni, ZhongMin Ren

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456835
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

ZnO films have been grown on silicon (100) and sapphire (0001) substrates by pulsed laser deposition (PLD). The influences of substrate temperature and laser fluence on the properties of the films were studied. The effects of annealing on the ZnO films were investigated by X-ray photoelectron spectroscopy (XPS). The surface properties of ZnO were studied by scanning tunneling spectroscopy (STS). The band edge emission properties of the ZnO films have been studied by the photoluminescence spectroscopy (PL).

Citation Download Citation

Yongfeng Lu, H. Q. Ni, and ZhongMin Ren "Optical and surface properties of ZnO thin films by PLD", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456835

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