Paper
8 August 2001 Compensation of convex corners in sensors with bossed structure etched in TMAH and TMAH+IPA solutions
Irena Barycka, Jan Dziuban, Malgorzata Kramkowska, Irena Zubel
Author Affiliations +
Proceedings Volume 4516, Optoelectronic and Electronic Sensors IV; (2001) https://doi.org/10.1117/12.435942
Event: Optoelectronic and Electronic Sensors IV, 2000, Gliwice, Poland
Abstract
Under etching of convex corners during the fabrication process of pressure sensor with the 'bossed' type structure seriously deteriorates parameters of these devices. The problem can be solved by application of properly designed masks with compensating corners.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irena Barycka, Jan Dziuban, Malgorzata Kramkowska, and Irena Zubel "Compensation of convex corners in sensors with bossed structure etched in TMAH and TMAH+IPA solutions", Proc. SPIE 4516, Optoelectronic and Electronic Sensors IV, (8 August 2001); https://doi.org/10.1117/12.435942
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KEYWORDS
Etching

Silicon

Photomasks

Crystals

Semiconducting wafers

Sensors

Anisotropic etching

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