Paper
11 March 2002 Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool
Author Affiliations +
Abstract
The paper presents results of a thorough study using the UV-based die-to-database mask inspection system ARISTM100i for the inspection of alternating phase shifting masks (AAPSM) designed for ArF (193nm) technology. Specially designed test masks were used to investigate sensitivity limitations of the i-line tool. Main focus is on phase errors, which were treated as a function of defect size, phase, and mask location. In addition, production reticles were inspected using a specially developed sensitivity AAPSM. Production issues like false defect rate and data preparation were addressed. The paper is concluded with a short printability analysis of different phase defects detected during the experiment.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anja Rosenbusch, Michael M. Har-zvi, and Gidon Gottlib "Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458284
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KEYWORDS
Inspection

Photomasks

Reticles

Databases

Lithography

Phase shifts

Binary data

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