Atomic fluorine source for chemical lasers

Steven J. Davis; David B. Oakes; Michael E. Read; Alan H. Gelb

doi:10.1117/12.465780

6 May 2002 Atomic fluorine source for chemical lasers

Steven J. Davis, David B. Oakes, Michael E. Read, Alan H. Gelb

Proceedings Volume 4631, Gas and Chemical Lasers and Intense Beam Applications III; (2002) https://doi.org/10.1117/12.465780
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States

Abstract

We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.

Citation Download Citation

Steven J. Davis, David B. Oakes, Michael E. Read, and Alan H. Gelb "Atomic fluorine source for chemical lasers", Proc. SPIE 4631, Gas and Chemical Lasers and Intense Beam Applications III, (6 May 2002); https://doi.org/10.1117/12.465780

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available