Tandem type resin for chemically amplified KrF positive resist

Yasunori Uetani; Masumi Suetsugu; Koichiro Ochiai; Airi Yamada; Ryotaro Hanawa; Nobuo Ando

doi:10.1117/12.474264

24 July 2002 Tandem type resin for chemically amplified KrF positive resist

Yasunori Uetani, Masumi Suetsugu, Koichiro Ochiai, Airi Yamada, Ryotaro Hanawa, Nobuo Ando

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474264
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A mixture of high Mw fractionated novolac resin and 2EAdMA (2-ethyl-2-adamantyle methacrylate)/HST (hydroxy styrene) copolymer brought about high resolution almost comparative to simple 2EAdMA/HST copolymer. Dry etching resistance was higher than 2EAdMA/HST copolymer. A mixture of unfractionated novolac resin and 2EAdMA/HST copolymer showed low resolution. Discrimination curve was measured by DRM on each case. Dissolution contrast of fractionated mixture was almost same as unfractionated one. Dissolution characteristics cannot tell the difference of resolution between fractionated and unfractionated novolac mixture.

Citation Download Citation

Yasunori Uetani, Masumi Suetsugu, Koichiro Ochiai, Airi Yamada, Ryotaro Hanawa, and Nobuo Ando "Tandem type resin for chemically amplified KrF positive resist", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474264

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