Surface microfabrication of fused silica glass by UV laser irradiation

Hiroyuki Niino; Yoshizo Kawaguchi; Tadatake Sato; Aiko Narazaki; Ximing Ding; Ryozo Kurosaki

doi:10.1117/12.529864

15 July 2004 Surface microfabrication of fused silica glass by UV laser irradiation

Hiroyuki Niino, Yoshizo Kawaguchi, Tadatake Sato, Aiko Narazaki, Ximing Ding, Ryozo Kurosaki

Proceedings Volume 5339, Photon Processing in Microelectronics and Photonics III; (2004) https://doi.org/10.1117/12.529864
Event: Lasers and Applications in Science and Engineering, 2004, San Jose, Ca, United States

Abstract

Surface micro-structuring of fused silica glass plates was performed by single-shot irradiation with a single-mode laser beam from a diode-pumped solid state UV laser at 355 nm. Well-defined micropattern without debris and microcrack formations around the etched area was fabricated by laser ablation with a focused laser-beam in the ambient air. The time-resolved optical emission spectra of plume were measured to elucidate the ablation behavior of silica glass induced by nanosecond-pulsed laser irradiation at 355 nm where absorption of silica glass is negligibly small. This method is suitable for rapid prototyping of surface microstructuing without a clean room environment.

Citation Download Citation

Hiroyuki Niino, Yoshizo Kawaguchi, Tadatake Sato, Aiko Narazaki, Ximing Ding, and Ryozo Kurosaki "Surface microfabrication of fused silica glass by UV laser irradiation", Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); https://doi.org/10.1117/12.529864

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