Projection maskless lithography

Christoph Brandstatter; Hans Loeschner; Gerhard Stengl; Gertraud Lammer; Herbert Buschbeck; Elmar Platzgummer; Hans-Joachim Doring; Thomas Elster; Olaf Fortagne

doi:10.1117/12.535412

20 May 2004 Projection maskless lithography

Christoph Brandstatter, Hans Loeschner, Gerhard Stengl, Gertraud Lammer, Herbert Buschbeck, Elmar Platzgummer, Hans-Joachim Doring, Thomas Elster, Olaf Fortagne

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.535412
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Recent studies have shown the feasibility of Projection Mask-Less Lithography (PML2) for small and medium volume device production (2-5 WPH) for the 45nm technology node. This PML2 tool concept comprises a combined electrostatic-magnetic electron optical column with 200x de-magnification factor. Instead of a mask there is a programmable aperture plate enabling dynamic beam structuring. Wafer exposure is done stripe-by-stripe with a scanning 300mm wafer stage. Detailed calculations of the PML2 optical column (2-step demagnification) including Monte-Carlo simulations of Coulomb interactions are presented. The extendibility of PML2 technology for the 32nm node will be discussed.

Citation Download Citation

Christoph Brandstatter, Hans Loeschner, Gerhard Stengl, Gertraud Lammer, Herbert Buschbeck, Elmar Platzgummer, Hans-Joachim Doring, Thomas Elster, and Olaf Fortagne "Projection maskless lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535412

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