Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackin; Jin Choi; Philip Schumaker; Van Nguyen; Frank Xu; Ecron Thompson; Daniel Babbs; S. V. Sreenivasan; Mike Watts; Norman Schumaker

doi:10.1117/12.538733

20 May 2004 Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S. V. Sreenivasan, Mike Watts, Norman Schumaker

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.538733
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Step and Flash^TM Imprint Lithography (S-FIL^TM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: • Residual layer control • Etch process development • Patterning of lines, contacts and posts • CD control • Defect and process life • Alignment and magnification control

Citation Download Citation

Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S. V. Sreenivasan, Mike Watts, and Norman Schumaker "Step and Repeat UV nanoimprint lithography tools and processes", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.538733

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