Implementation of pattern-specific illumination pupil optimization on Step & Scan systems

Andre Engelen; Robert John Socha; Eric Hendrickx; Wieger Scheepers; Frank Nowak; Marco Van Dam; Armin Liebchen; Denis A.M. Faas

doi:10.1117/12.544240

28 May 2004 Implementation of pattern-specific illumination pupil optimization on Step & Scan systems

Andre Engelen, Robert John Socha, Eric Hendrickx, Wieger Scheepers, Frank Nowak, Marco Van Dam, Armin Liebchen, Denis A.M. Faas

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.544240
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Step&Scan systems are pushed towards low k₁ applications. Contrast enhancement techniques are crucial for successful implementation of these applications in a production environment. A NA - sigma - illumination mode optimizer and a contrast-based optimization algorithm are implemented in LithoCruiser in order to optimize illumination setting and illumination pupil for a specific repetitive pattern. Calculated illumination pupils have been realized using Diffractive Optical Elements (DOE), which are supported by ASML's AERIAL II illuminator. The qualification of the illumination pupil is done using inline metrology on the ASML Step & Scan system. This paper describes the process of pattern specific illumination optimization for a given mask. Multiple examples will be used to demonstrate the advantage of using non-standard illumination pupils.

Citation Download Citation

Andre Engelen, Robert John Socha, Eric Hendrickx, Wieger Scheepers, Frank Nowak, Marco Van Dam, Armin Liebchen, and Denis A.M. Faas "Implementation of pattern-specific illumination pupil optimization on Step & Scan systems", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.544240

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