Suppression of sidelobe and overlap error in AttPSM metal layer lithography using rule-based OPC

Hoong Joo Lee; Mi-Young Lee; Jun-Ha Lee

doi:10.1117/12.534484

28 May 2004 Suppression of sidelobe and overlap error in AttPSM metal layer lithography using rule-based OPC

Hoong Joo Lee, Mi-Young Lee, Jun-Ha Lee

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.534484
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Overlap errors and sidel-lobe printing caused by the design rule reduction in the lithography using attenuated phase shift mask have become serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact or via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to enhance DOF at the same time. Compared to the existing Cr shield method, the proposed rule-based correction with scattering bars can reduce the process complexity and time for mask production.

Citation Download Citation

Hoong Joo Lee, Mi-Young Lee, and Jun-Ha Lee "Suppression of sidelobe and overlap error in AttPSM metal layer lithography using rule-based OPC", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.534484

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