Nanofabrication of nanopattern and microdevices using contact/proximity lithography

Yung-Chiang Ting; Shyi-Long Shy; Ming-Chun Lee; Bau-Tong Dai

doi:10.1117/12.557750

20 August 2004 Nanofabrication of nanopattern and microdevices using contact/proximity lithography

Yung-Chiang Ting, Shyi-Long Shy, Ming-Chun Lee, Bau-Tong Dai

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557750
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

The oldest lithography technique contact/proximity printing are widely used for research activity, most MEMS, Bio-Chip and Optical Electro devices can be fabricated by this method. In this paper, deep submicron 1x mask can be fabricated easily by using e-beam exposure, chemically amplified resist (CAR) and Cr dry etching, a chemical shrink method using dry/wet etching technology was proposed for nanofabrication by using Cr film as hard mask. Micro channel for biochip as well as micro lens for Optical Electro devices can easily be fabricated on glass and quartz substrates by this method.

Citation Download Citation

Yung-Chiang Ting, Shyi-Long Shy, Ming-Chun Lee, and Bau-Tong Dai "Nanofabrication of nanopattern and microdevices using contact/proximity lithography", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557750

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