Paper
4 November 2004 Fabrication of parabolic nanofocusing x-ray lenses
Olga Kurapova, Sebastian Feste, Malte Gather, Til Florian Gunzler, U. T. Hunger, Marion Kuhlmann, Jens Patommel, Christian G. Schroer, Bruno Lengeler, Andre van der Hart
Author Affiliations +
Abstract
We have fabricated planar parabolic lenses made of silicon and boron which have a focal distance in the range of a few millimetres at hard x-ray energies. Two silicon lenses were used in a crossed geometry to generate a microbeam with a lateral size of 160x107 nm2 at 15 keV. The focus size of 180 nm at 22 keV and at a distance from the synchrotron radiation source of 42 m was obtained with boron lens. The performance of the silicon lenses was improved by optimising the e-beam lithography and the etching parameters. In addition, we report on the microfabrication process of diamond as well as pyrolytic graphite lenses.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olga Kurapova, Sebastian Feste, Malte Gather, Til Florian Gunzler, U. T. Hunger, Marion Kuhlmann, Jens Patommel, Christian G. Schroer, Bruno Lengeler, and Andre van der Hart "Fabrication of parabolic nanofocusing x-ray lenses", Proc. SPIE 5539, Design and Microfabrication of Novel X-Ray Optics II, (4 November 2004); https://doi.org/10.1117/12.563921
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Cited by 1 scholarly publication.
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KEYWORDS
Etching

Lenses

Diamond

Boron

Photomasks

Reactive ion etching

Silicon

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