Development of new chrome blanks for 65-nm node and beyond

Masahiro Hashimoto; Takeyuki Yamada; Minoru Sakamoto; Mutsumi Hara; Yasushi Ohkubo II; Masao Ushida

doi:10.1117/12.580776

6 December 2004 Development of new chrome blanks for 65-nm node and beyond

Masahiro Hashimoto, Takeyuki Yamada, Minoru Sakamoto, Mutsumi Hara, Yasushi Ohkubo II, Masao Ushida

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.580776
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

For advanced reticle fabrication, a resist thinning technique continues a promising trend of the resolution enhancement. To bring out thin resist performances, a new chrome absorber has been developed for the second layer of 193nm att-PSM. The new chrome absorber is thinner and has a higher dry-etch rate than our current products, such as NTAR5. This new chrome absorber can utilize a super thin resist application because of a reduction in dry-etching time. Additionally, a technique of film stress reduction was also developed to reduce placement shift by film stress relaxation. The new chrome absorber with super thin resist (TF blanks) exceeds current products in the mask-making metrics of resolution and CD performance. This performance will meet the requirements of 65nm-node and beyond.

Citation Download Citation

Masahiro Hashimoto, Takeyuki Yamada, Minoru Sakamoto, Mutsumi Hara, Yasushi Ohkubo II, and Masao Ushida "Development of new chrome blanks for 65-nm node and beyond", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.580776

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