Influence of a new surface treatment method on ohmic contact resistivity of p-type GaN

Yingwen Tang; Xue Li; Yong Kang; Xiangyang Li; Haimei Gong

doi:10.1117/12.572681

20 January 2005 Influence of a new surface treatment method on ohmic contact resistivity of p-type GaN

Yingwen Tang, Xue Li, Yong Kang, Xiangyang Li, Haimei Gong

Proceedings Volume 5633, Advanced Materials and Devices for Sensing and Imaging II; (2005) https://doi.org/10.1117/12.572681
Event: Photonics Asia, 2004, Beijing, China

Abstract

The contact resistivity of Ni/Au contact on p-type GaN was drastically decreased through the surface treatments in sequence using alcohol-based HCl and KOH solution. The surface oxide on p-type GaN formed during epitaxial growth was removed in the alcohol-based HCl and KOH solution, The O 1s and C 1s core-level peaks in the x-ray photoemission spectra showed that the alcohol-based HCl treatment was more effective in removing of the surface oxide layer. Compared to the KOH solution treated sample, the alcohol-based HCl-treated sample showed a Ga 2p core-level peak which was shifted toward the valence-band edge by 0.3 eV, indicating that the surface Fermi level was shifted toward the valence-band edge. These results suggest that the surface barrier height for hole injection from Ni/Au metal to p-type GaN be lowered by the surface treatment, which results in a drastic reduction in specific contact resistance.

Citation Download Citation

Yingwen Tang, Xue Li, Yong Kang, Xiangyang Li, and Haimei Gong "Influence of a new surface treatment method on ohmic contact resistivity of p-type GaN", Proc. SPIE 5633, Advanced Materials and Devices for Sensing and Imaging II, (20 January 2005); https://doi.org/10.1117/12.572681

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