A new process has been developed to create vertically-integrated photonic and optoelectronic circuits in silicon. The approach is the 3-D extension of the SIMOX process where buried SiO2 sections can be selectively created by using oxygen implantation, through a mask, followed by annealing. By controlling the implant energy, dose, mask area and thickness, arbitrary 3-D arrangements of Silicon/SiO2 can be created. The process has been used to create vertically coupled microdisk resonators and add-drop wavelength multiplexers on a silicon wafer.
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