Development in gas-discharge drive lasers for LPP EUV sources

V. B. Fleurov; P. C. Oh; T. D. Steiger; I. F. Fomenkov; W. N. Partlo

doi:10.1117/12.601037

6 May 2005 Development in gas-discharge drive lasers for LPP EUV sources

V. B. Fleurov, P. C. Oh, T. D. Steiger, I. F. Fomenkov, W. N. Partlo

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601037
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Development of a drive laser with sufficient output power, high beam quality, and economical cost of consumables is critical to the successful implementation of a laser-produced plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system using two gas-discharge power amplifiers and repetition rates exceeding 10 kHz to produce more than 2kW output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet high volume manufacturing requirements

Citation Download Citation

V. B. Fleurov, P. C. Oh, T. D. Steiger, I. F. Fomenkov, and W. N. Partlo "Development in gas-discharge drive lasers for LPP EUV sources", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601037

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