Performance study of CD mark size for angular scatterometry

Yi-sha Ku; Ding-Sheng Pan; Shih-Chun Wang; C. H. Tung; Chun-Hung Ko; Sheng-Hua Lu; Nigel Smith

doi:10.1117/12.599188

10 May 2005 Performance study of CD mark size for angular scatterometry

Yi-sha Ku, Ding-Sheng Pan, Shih-Chun Wang, C. H. Tung, Chun-Hung Ko, Sheng-Hua Lu, Nigel Smith

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.599188
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We report a study of the effect of target size on CD measurement by angular scatterometry in two ways. One is reducing the spot size (say to 40 mm) to permit the use of a smaller target; another is to overfill the target. Starting with standard grating targets of 80 x 80 mm size, with fixed CD 400 nm and LS (Linewidth to Spacing) ratio 1:1, test gratings have been designed with X and Y dimensions varied from 80 to 10 mm in 10 mm intervals. We show how the scattering signatures are influenced by the varying target sizes and spot sizes especially when the target grating is overfilled. The errors in CD measurements caused by the target and spot size variations are also quantified. Working with an overfilled small grating target and filtering out the specular noise offers a promising way to present the scattering signal from diffraction. An empirical model to predict the scattering signatures as a function of target size is under development.

Citation Download Citation

Yi-sha Ku, Ding-Sheng Pan, Shih-Chun Wang, C. H. Tung, Chun-Hung Ko, Sheng-Hua Lu, and Nigel Smith "Performance study of CD mark size for angular scatterometry", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.599188

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