Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition

Jue Wang; Robert L. Maier; Horst Schreiber

doi:10.1117/12.677539

28 August 2006 Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition

Jue Wang, Robert L. Maier, Horst Schreiber

Proceedings Volume 6286, Advances in Thin-Film Coatings for Optical Applications III; 628604 (2006) https://doi.org/10.1117/12.677539
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Metal oxide layers produced by plasma ion-assisted deposition are extensively used for complex optical coatings due to the availability of materials, the high packing density of films, and the smooth surfaces. Stringent optical surface figure specifications necessary for both laser optics and precision optics require film stress to be well controlled and surface deformation to be corrected or compensated. In this paper, SiO₂ based single cavity UV narrow bandpass filters were prepared by plasma ion-assisted deposition. The correlation between film stress, refractive index, deposition parameters, and post deposition annealing was established. The film stress was calculated based on interferometric surface deformation. The refractive index and film thickness were determined by means of variable angle spectroscopic ellipsometry. The center wavelength of the filters was obtained through spectral transmission measurement. The results suggest that the wavefront distortion of the multilayer coatings is dominated by the compressive stress of the SiO₂ layers, and can be controlled and corrected by the amount of plasma ion momentum transfer, substrate temperature, post deposition annealing, and stress compensation via backside SiO₂ coating. Based on the understanding of the mechanical and optical properties, the wavefront correction technique enables us to satisfy stringent surface figure specifications.

Citation Download Citation

Jue Wang, Robert L. Maier, and Horst Schreiber "Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition", Proc. SPIE 6286, Advances in Thin-Film Coatings for Optical Applications III, 628604 (28 August 2006); https://doi.org/10.1117/12.677539

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available