Models for predicting the index of refraction of compounds at 193 and 589 nm

Robert L. Brainard; Seth Kruger; Eric Block

doi:10.1117/12.712431

22 March 2007 Models for predicting the index of refraction of compounds at 193 and 589-nm

Robert L. Brainard, Seth Kruger, Eric Block

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651920 (2007) https://doi.org/10.1117/12.712431
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A simple empirical model is presented that predicts the index of refraction at 589 nm (D-line) and 193 nm for molecules based solely on chemical structure. The model was built by comparing literature values of refractive indices (sodium D-line 589 nm) of compounds with representative functionalities and has 18 adjustable parameters. Published values for n_D and n₁₉₃ were used to extrapolate the predictions from values of n_D to values of n₁₉₃. These simple, accessible models can be run using only Excel software on a laptop computer.

Citation Download Citation

Robert L. Brainard, Seth Kruger, and Eric Block "Models for predicting the index of refraction of compounds at 193 and 589-nm", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651920 (22 March 2007); https://doi.org/10.1117/12.712431

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