A heater plate assisted integrated bake/chill system for photoresist processing

Hui-Tong Chua; Arthur Tay; Yuheng Wang; Xiaodong Wu

doi:10.1117/12.711688

21 March 2007 A heater plate assisted integrated bake/chill system for photoresist processing

Hui-Tong Chua, Arthur Tay, Yuheng Wang, Xiaodong Wu

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65193H (2007) https://doi.org/10.1117/12.711688
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A thermal processing module, which consists of a dense distribution of multivariate controlled heat/chill elements, is developed to achieve temperature uniformity of a silicon wafer throughout the processing temperature cycle of ramp, hold and quench in microlithography. In the proposed unit, the bake and chill steps are conducted sequentially within the same module without any substrate movement. The unit includes two heating sources. The first is a mica heater which serves as the dominant means for heat transfer. The second is a set of thermoelectric devices (TEDs) which are used to provide a distributed amount of heat to the substrate for uniformity and transient temperature control. The TEDs also provide active cooling for chilling the substrate to a temperature suitable for subsequent processing steps. The feasibility of a practical system is demonstrated via detailed modeling and simulations based on first principle heat transfer analysis.

Citation Download Citation

Hui-Tong Chua, Arthur Tay, Yuheng Wang, and Xiaodong Wu "A heater plate assisted integrated bake/chill system for photoresist processing", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65193H (21 March 2007); https://doi.org/10.1117/12.711688

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