Fast near field simulation of optical and EUV masks using the waveguide method

Peter Evanschitzky; Andreas Erdmann

doi:10.1117/12.736978

3 May 2007 Fast near field simulation of optical and EUV masks using the waveguide method

Peter Evanschitzky, Andreas Erdmann

Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330Y (2007) https://doi.org/10.1117/12.736978
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France

Abstract

A new and optimized waveguide based electromagnetic field solver for optical and EUV mask simulations is presented. After an introduction of the waveguide method, the convergence and speed optimization and the adaptation of the method to optical and EUV lithography mask simulations are presented. Additionally a model for the simulation of EUV multilayer defects and an optimized decomposition technique for three dimensional waveguide simulations enabling very fast computations as well as large mask area simulations is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV masks.

Citation Download Citation

Peter Evanschitzky and Andreas Erdmann "Fast near field simulation of optical and EUV masks using the waveguide method", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330Y (3 May 2007); https://doi.org/10.1117/12.736978

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