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The maintenance of the growth of the multibillion-dollar semiconductor industry requires the development of techniques
for the fabrication and characterisation of nanoscale devices. Consequently, there is great interest in photolithography
techniques such as extreme UV and x-ray. Both of these techniques are extremely expensive and technologically very
demanding. In this paper we describe research on the feasibility of exploiting x-ray propagation within carbon nanotubes
(CNT's) for the fabrication and characterisation of nanoscale devices. This work discusses the parameters determining
the design space available. To demonstrate experimentally the feasibility of x-ray propagation, arrays of carbon
nanotubes have been grown on silicon membranes. The latter are required to provide structural support for the CNT's
while minimising energy loss. To form a waveguide metal is deposited between the nanotubes to block x-ray
transmission in this region at the same time as cladding the CNT's. The major challenge has been to fill the spaces
between the CNT's with material of sufficient thickness to block x-ray transmission while maintaining the structural
integrity of the CNT's. Various techniques have been employed to fill the gaps between the nanotubes including
electroplating, sputtering and evaporation. This work highlights challenges encountered in optimising the process.
P. A. Childs,S. Y. Ong,D. C. Herbert,W. I. Milne,K. B. K. Teo,N. G. Shang,L. Gangloff,A. D. Smith, andA. G. O'Neill
"X-ray propagation in carbon nanotubes", Proc. SPIE 6634, International Conference on Charged and Neutral Particles Channeling Phenomena II, 66341K (23 May 2007); https://doi.org/10.1117/12.742067
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P. A. Childs, S. Y. Ong, D. C. Herbert, W. I. Milne, K. B. K. Teo, N. G. Shang, L. Gangloff, A. D. Smith, A. G. O'Neill, "X-ray propagation in carbon nanotubes," Proc. SPIE 6634, International Conference on Charged and Neutral Particles Channeling Phenomena II, 66341K (23 May 2007); https://doi.org/10.1117/12.742067