Paper
17 September 2007 Micro- and nanoprocessing of organic polymers using a compact laser plasma EUV source equipped with EUV optical systems
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Abstract
Results on micro- and nanoprocessing of organic polymers with extreme ultraviolet (EUV) radiation from a compact laser plasma EUV source based on a gas puff target are presented in the paper. Processing of polymers is connected with non-thermal ablation under the influence of energetic EUV photons. The process can be useful for practical applications as it makes possible to produce structures with sub-micron spatial resolution that is not possible using the thermal ablation. The new technology will be used for production of photonic microstructures and for modification of polymer surfaces for biomedical applications.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henryk Fiedorowicz, Andrzej Bartnik, Krzysztof Jakubczak, Roman Jarocki, Jerzy Kostecki, Ladislav Pina, Rafał Rakowski, Anna Szczurek, and Mirosław Szczurek "Micro- and nanoprocessing of organic polymers using a compact laser plasma EUV source equipped with EUV optical systems", Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 67030C (17 September 2007); https://doi.org/10.1117/12.735588
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KEYWORDS
Extreme ultraviolet

Polymers

Plasma

Mirrors

Laser ablation

Photons

Multilayers

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