Use of layout automation and design-based metrology for defect test mask design and verification

Chris Spence; Cyrus Tabery; Andre Poock; Arndt C. Duerr; Thomas Witte; Jan Fiebig; Jan Heumann

doi:10.1117/12.746953

16 November 2007 Use of layout automation and design-based metrology for defect test mask design and verification

Chris Spence, Cyrus Tabery, Andre Poock, Arndt C. Duerr, Thomas Witte, Jan Fiebig, Jan Heumann

Author Affiliations +

Proceedings Volume 6730, Photomask Technology 2007; 67300P (2007) https://doi.org/10.1117/12.746953
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

This paper studies the impact of shape and local environment (pattern layout) on the ability to detect defects on the reticle and the extent to which they affect the dimension of the printed image on the wafer. The authors have made extensive use of design information to perform a thorough evaluation. OPC software was used to generate mask data that was comparable to product mask data. Defects were placed on the post-OPC layout and OPC software was also used to simulate the dimension of the defective features as printed on the wafer. "Design Based Metrology" was used to create accurate metrology recipes to support wafer and mask metrology. Ultimately the procedures described in this paper allow a direct correlation to be made between reticle inspectability and the impact of the same defects on wafer CD. Data is presented for the case of the Contact Hole layer of a "65nm" Logic technology, though the methods described in the paper are applicable to all layers.

Citation Download Citation

Chris Spence, Cyrus Tabery, Andre Poock, Arndt C. Duerr, Thomas Witte, Jan Fiebig, and Jan Heumann "Use of layout automation and design-based metrology for defect test mask design and verification", Proc. SPIE 6730, Photomask Technology 2007, 67300P (16 November 2007); https://doi.org/10.1117/12.746953

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE