A practical solution to the critical problem of 193 nm reticle haze

Oleg Kishkovich; Dave Halbmaier; Xavier Gabarre; Brian Grenon; James Lo; Andy Lam; Tom Chen

doi:10.1117/12.747511

30 October 2007 A practical solution to the critical problem of 193 nm reticle haze

Oleg Kishkovich, Dave Halbmaier, Xavier Gabarre, Brian Grenon, James Lo, Andy Lam, Tom Chen

Proceedings Volume 6730, Photomask Technology 2007; 67301A (2007) https://doi.org/10.1117/12.747511
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

The authors have developed and successfully implemented a practical, yet effective solution to help eliminate haze formation in the production fab. Based on a novel mechanism of haze formation described earlier, along with a thorough understanding of the reticle surface chemistry changes during the manufacturing process, the authors found an unexpectedly simple and straightforward way to prevent haze formation. This is possible regardless of the origin of the reticle, by controlling the purity of the immediate reticle environment.

Citation Download Citation

Oleg Kishkovich, Dave Halbmaier, Xavier Gabarre, Brian Grenon, James Lo, Andy Lam, and Tom Chen "A practical solution to the critical problem of 193 nm reticle haze", Proc. SPIE 6730, Photomask Technology 2007, 67301A (30 October 2007); https://doi.org/10.1117/12.747511

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available