Comparison of ns and ps pulses for Si and glass micromachining applications

Stephen Lee; Allan Ashmead; Leonard Migliore

doi:10.1117/12.811064

5 March 2009 Comparison of ns and ps pulses for Si and glass micromachining applications

Stephen Lee, Allan Ashmead, Leonard Migliore

Proceedings Volume 7193, Solid State Lasers XVIII: Technology and Devices; 719322 (2009) https://doi.org/10.1117/12.811064
Event: SPIE LASE: Lasers and Applications in Science and Engineering, 2009, San Jose, California, United States

Abstract

Demand for higher precision, clean laser based processes has driven the development of picosecond pulse width lasers that operate at high frequency with high average powers. Industries like microelectronics and LCD manufacturing are gearing up for the next generation of devices that demand tighter densities, better electrical efficiency, higher speed and better quality. We focus here on the differences between processing with nanosecond and picosecond pulses on Silicon and on alumino-borosilicate glass.

Citation Download Citation

Stephen Lee, Allan Ashmead, and Leonard Migliore "Comparison of ns and ps pulses for Si and glass micromachining applications", Proc. SPIE 7193, Solid State Lasers XVIII: Technology and Devices, 719322 (5 March 2009); https://doi.org/10.1117/12.811064

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