CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 7271 > Article
Open Access Paper
17 March 2009 REBL nanowriter: Reflective Electron Beam Lithography
Paul Petric, Chris Bevis, Alan Brodie, Allen Carroll, Anthony Cheung, Luca Grella, Mark McCord, Henry Percy, Keith Standiford, Marek Zywno
Author Affiliations +
Proceedings Volume 7271, Alternative Lithographic Technologies; 727107 (2009) https://doi.org/10.1117/12.817319
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
REBL (Reflective Electron Beam Lithography) is being developed for high throughput electron beam direct write maskless lithography. The system is specifically targeting 5 to 7 wafer levels per hour throughput on average at the 45 nm node, with extendibility to the 32 nm node and beyond. REBL incorporates a number of novel technologies to generate and expose lithographic patterns at estimated throughputs considerably higher than electron beam lithography has been able to achieve as yet. A patented reflective electron optic concept enables the unique approach utilized for the Digital Pattern Generator (DPG). The DPG is a CMOS ASIC chip with an array of small, independently controllable cells or pixels, which act as an array of electron mirrors. In this way, the system is capable of generating the pattern to be written using massively parallel exposure by ~1 million beams at extremely high data rates (~ 1Tbps). A rotary stage concept using a rotating platen carrying multiple wafers optimizes the writing strategy of the DPG to achieve the capability of high throughput for sparse pattern wafer levels. The exposure method utilized by the DPG was emulated on a Vistec VB-6 in order to validate the gray level exposure method used in REBL. Results of these exposure tests are discussed.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Paul Petric, Chris Bevis, Alan Brodie, Allen Carroll, Anthony Cheung, Luca Grella, Mark McCord, Henry Percy, Keith Standiford, and Marek Zywno "REBL nanowriter: Reflective Electron Beam Lithography", Proc. SPIE 7271, Alternative Lithographic Technologies, 727107 (17 March 2009); https://doi.org/10.1117/12.817319
PROCEEDINGS
 15 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 29 scholarly publications and 4 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Semiconducting wafers
Electron beam lithography
Lithography
Electron beams
Reflectivity
Prisms
Wafer-level optics
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top