Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV

Tim Tsarfati; Erwin Zoethout; Eric Louis; Robbert van de Kruijs; Andrey Yakshin; Stephan Müllender; Fred Bijkerk

doi:10.1117/12.824434

18 March 2009 Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV

Tim Tsarfati, Erwin Zoethout, Eric Louis, Robbert van de Kruijs, Andrey Yakshin, Stephan Müllender, Fred Bijkerk

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713V (2009) https://doi.org/10.1117/12.824434
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We present a computational and experimental study on interface passivation of B₄C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB₆ and LaC₂ interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm.

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Tim Tsarfati, Erwin Zoethout, Eric Louis, Robbert van de Kruijs, Andrey Yakshin, Stephan Müllender, and Fred Bijkerk "Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713V (18 March 2009); https://doi.org/10.1117/12.824434

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