Nano-pattern design and technology for patterned media magnetic recording

Hiroyuki Kataoka; Yoshiyuki Hirayama; Thomas R. Albrecht; Masahito Kobayashi

doi:10.1117/12.824261

11 May 2009 Nano-pattern design and technology for patterned media magnetic recording

Hiroyuki Kataoka, Yoshiyuki Hirayama, Thomas R. Albrecht, Masahito Kobayashi

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73790K (2009) https://doi.org/10.1117/12.824261
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

About the patterned media magnetic recording technology, which is anticipated one of the new generation technologies to replace conventional perpendicular magnetic recording beyond 1Tb/in², the technology back ground, two major options, performance expectations were discussed. Then the requirements for the template (mold) for the nano-imprint lithography, which is irreplaceable technology for pattern media, were discussed.

Citation Download Citation

Hiroyuki Kataoka, Yoshiyuki Hirayama, Thomas R. Albrecht, and Masahito Kobayashi "Nano-pattern design and technology for patterned media magnetic recording", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790K (11 May 2009); https://doi.org/10.1117/12.824261

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available