AFM characterization of large area micro-optical elements

M. Oliva; T. Benkenstein; M. Flemming; U. D. Zeitner

doi:10.1117/12.834223

17 June 2009 AFM characterization of large area micro-optical elements

M. Oliva, T. Benkenstein, M. Flemming, U. D. Zeitner

Proceedings Volume 7389, Optical Measurement Systems for Industrial Inspection VI; 73893K (2009) https://doi.org/10.1117/12.834223
Event: SPIE Europe Optical Metrology, 2009, Munich, Germany

Abstract

We discuss AFM (Atomic Force Microscopy) characterization in terms of critical dimension and depth for large area micro-optical elements. Results are shown and discussed in comparison with other techniques, such as SEM (Scanning Electron Microscopy) for CD measurements and FIB (Focused Ion Beam)-SEM characterization for the structure profile.

Citation Download Citation

M. Oliva, T. Benkenstein, M. Flemming, and U. D. Zeitner "AFM characterization of large area micro-optical elements", Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73893K (17 June 2009); https://doi.org/10.1117/12.834223

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