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Uniform coating of large areas is a technically challenging aspect of physical vapor deposition. This investigation shows
that good film uniformity across large areas can be repetitively achieved by a DC magnetron sputtering process by use of
multiple sources. A unique feature of this technique is the ability to predict and control the film distribution using the
deposition rate, adding flexibility to the deposition system. A model for predicting the material distribution from
multiple sources is presented. It will also be demonstrated that this process yields efficient use of the vapor generated
from the sources, which results in higher deposition rates and less system maintenance.
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David W. Reicher, Roberto Christian, Patrick Davidson, Stanley Z. Peplinski, "Use of multiple DC magnetron deposition sources for uniform coating of large areas," Proc. SPIE 7409, Thin Film Solar Technology, 740909 (20 August 2009); https://doi.org/10.1117/12.824882